This project focuses on detailed placemenet for designs with multiple-row height standard cells in advanced technology nodes. We present MrDP, a detailed placer that can handle multiple-row height cells in designs.
Power line alignement for multiple-row height cells |
Multiple-row height cells in layout |
MrDP Overview
A chain move scheme that generalizes the movement of heterogeneous-sized cells to optimize wirelength, cell and pin density by searching for the maximum prefix sum of the improvements.
A nested dynamic programming based technique solving ordered double-row placement for wirelength optimization.
Outperform the most recent detailed placer [TCAD’16 Wu] for multiple-row height cells by 3.7% in scaled wirelength, 20.2% in cell density and 13.4% in pin density.
Updated executables: Version 2.0.0 (binary of [DAC’16 Chow] is not included)
Evaluation scripts: Version 1.1.0 (modified from ICCAD 2013 evaluation script to support pin density)
TCAD 2017 Solutions: Bookshelf
Benchmarks for [TCAD’16 Wu]: Please contact Dr. Gang Wu and Prof. Chris Chu at Iowa State University
Modified ICCAD 2014 placement contest benchmarks with multiple-row cells: LEF/DEF & Bookshelf
Yibo Lin, Bei Yu, Xiaoqing Xu, Jhih-Rong Gao, Natarajan Viswanathan, Wen-Hao Liu, Zhuo Li, Charles J. Alpert and David Z. Pan, “MrDP: Multiple-row Detailed Placement of Heterogeneous-sized Cells for Advanced Nodes”, IEEE/ACM International Conference on Computer-Aided Design (ICCAD), Austin, TX, Nov. 7–10, 2016.
Yibo Lin, Bei Yu, Xiaoqing Xu, Jhih-Rong Gao, Natarajan Viswanathan, Wen-Hao Liu, Zhuo Li, Charles J Alpert and David Z. Pan, “MrDP: Multiple-row Detailed Placement of Heterogeneous-sized Cells for Advanced Nodes”, IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems (TCAD), 2017.
You must agree with the license terms to use the software.