Links
Resume
My Resume is linked here formated PDF.
Research Experience
- 08/2007 ~ Current: The Universityof Texas at Austin, Austin TX USA
- Research Assistant
- VLSI Design Automation, DFM (design for manufacturability)
- Predictive Lithography Modeling, Double Patterning, Lithography driven physical design
- 05/2002 ~ 05/2007: SAMSUNG ELECTRONICS, Semiconductor R&D Center, Hwasung, Korea
- Senior engineer in CAE Team
- OPC (optical proximity correction) and RET (resolution enhancement tech.)
- LFL (litho. friendly layout) and RDR (restricted design rule)
- Development of in-house Photo-lithography simulator, FAITH
- Co-development of in-house Mask E-beam simulator, ELIS
- 02/2000 ~ 04/2002: SILICON TECH LTD, R&DCenter, Yongin, Korea
- Researcher
- Development of s/w scheduler of the Photo-Resist (PR) Coater/Developer
Co-op & Internship
- 05/2008 ~ 08/2008: FREESCALE Semiconductor, Austin TX USA
- Standard Cell Library Design Team
- Model-based DFM for Cell library optimization considering litho, process, supply voltage, placement def
- Sensitivity check for standard cell library
Skill
- Programming: C/C++, Tcl/Tk, JAVA, Verilog
- EDA Tools
- TCAD: Sentaurus, Medici
- Lithography: SOLID-E, ProLith
- OPC: Calibre-wb, Proteus, Progen, SiVL
- Design: Virtuoso, Verilog-XL, Encounter
- Simulation: HSPICE, Primetime
- Certificate
- SCJP: Sun Certificate Java Programmer
- Six-sigma: Green Belt
Courses at UT
Spring 2008
- VLSI I (Prof. David Pan)
- Textbook: Weste and Harris, CMOS VLSI Design: A Circuits and Systems Perspective, Addison Wesley/Pearson, 3rd Edition, 2005
Fall 2007
- Fourier Optics (Prof. Micheal Becker)
- Textbook: J. W. Goodman, Introduction to Fourier Optics, 3rd ed., Roberts & Company, Englewood, Colorado, USA, 2005
- Optimization Issues on VLSI CAD (Prof. David Pan)
- We will examine several key aspects for nanometer design optimizations for performance, power, and manufacturability
- Interconnect modeling/optimization, and physical synthesis
- Low power – key design limiter
- Manufacturability
- Reliability, signal integrity, etc.