Home > Publications

PUBLICATIONS

Jump to Conference Papers Journal Articles  Patents

CONFERENCE PAPERS (Go to Top)

  1. Peng Yu and David Z. Pan, "TIP-OPC: A New Topological Invariant Paradigm for Pixel Based Optical Proximity Correction", Proc. IEEE/ACM Int'l Conference on Computer-Aided Design (ICCAD), November 2007.
  2. Peng Yu and David Z. Pan, "A Novel Intensity Based OPC Algorithm with Speedup in Lithography Simulation", Proc. IEEE/ACM Int'l Conference on Computer-Aided Design (ICCAD), November 2007.
  3. Peng Yu and David Z. Pan, "TIP-OPC: A New Topological Invariant Paradigm for Pixel Based Optical Proximity Correction", Proc. SRC Techcon Conference, September, 2007.
  4. Peng Yu and D. Z. Pan, "Fast Predictive Post-OPC Contact/Via Printability Metric and Validation", Proc. of SPIE Optical Microlithography XX,  Vol. 6520, 2007.
  5. Sean X. Shi, Peng Yu, and David Z. Pan, "A Unified Non-Rectangular Device and Circuit Simulation Model for Timing and Power", Proc. IEEE/ACM Int'l Conference on Computer-Aided Design (ICCAD), November, 2006.
  6. Peng Yu, Sean X. Shi and David Z. Pan, "Process Variation Aware OPC with Variational Lithography Modeling", Proc.43rd ACM/IEEE Design Automation Conference (DAC), San Francisco, California, July, 2006.
  7. Peng Yu, David Z. Pan and Chris A. Mack, Fast Lithography Simulation under Focus Variations for OPC and Layout Optimizations", SPIE Design and Process Integration for Microelectronic Manufacturing IV, Feb. 2006.
  8. Joydeep Mitra, Peng Yu and D. Z. Pan, "RADAR: RET-Aware Detailed Routing Using Fast Lithography Simulations", Proc. 42nd ACM/IEEE Design Automation Conference (DAC), Anaheim, California, June, 2005.
  9. Joydeep Mitra, Peng Yu and D. Z. Pan, "RADAR: RET-Aware Detailed Routing", Electronic Design Process (EDP) Workshop, Monterey, California, April, 2005.

JOURNAL ARTICLES PAPERS (Go to Top)

  1. Peng Yu, Sean X. Shi, and D. Z. Pan, "True Process Variation Aware Optical Proximity Correction with Variational Lithography Modeling and Model Calibration", The Journal of Microlithography, Microfabrication, and Microsystems (JM3), Special Edition of Resolution Enhancement Techniques and Design for Manufacturability, September 2007.

PATENTS (Go to Top)

  1. Zhigang Pan and Peng Yu, "Method and System for Performing Optical Proximity Correction with Process", U.S. Patent Application 11/923,927.