IEEE/ACM Workshop on Variability Modeling and Characterization

(VMC) 2009

November 5th,  2009

Double Tree Hotel, San Jose, CA

Registration: $125 through ICCAD

(Program of VMC 2008 is available here)

It is widely recognized that process variation is emerging as a fundamental challenge to IC design in scaled CMOS technology; and it will have profound impact on nearly all aspects of circuit performance. While some of the negative effects of variability can be handled with improvements in the manufacturing process, the industry is starting to accept the fact that some of the effects are better mitigated during the design process. Handling variability in the design process will require accurate and appropriate models of variability and its dependence on designable parameters (i.e. layout), and its spatial and temporal distributions. It also requires carefully designed test structures and proper statistical data analysis methods to extract meaningful models from large volumes of silicon measurements. The resulting compact modeling of systematic, random, spatial, and temporal variations is essential to abstract the physical level variations into a format the designers (and more importantly, the tools they use) can utilize. This workshop provides a forum to discuss current practice as well as near future research needs in test structure design, variability characterization, compact variability modeling, and statistical simulation.

Report from VMC 2009: PDF


Key Topics

   Physics mechanisms and technology trends of device-level variations

   First-principles simulation methods for predicting variability

   Time-dependent variation and their interaction with other variation sources

   Compact modeling of variations in devices and interconnect

   Device and circuit level modeling techniques

   Test structure design for variability

   Variability characterization, bounding and extraction

   Statistical data analysis and model extraction methods

   Novel implementation and simulation techniques for dealing with variability

Tentative Agenda (talk abstract in PDF)

8:20 8:30am      Opening Remarks

8:30 10:00am    Session I: Atomistic-Level Variations

Scott Roy (Univ. of Glasgow): Atomistic Simulation of Variability

Tsu-Jae King Liu (UC Berkeley): Nanoscale Transistor Design Optimization in Consideration of Atomistic Effects

Naoki Tega (Hitachi America): Study on Variability in Transistor Characteristics due to Random Telegraph Noise

10:00 10:30am  Morning Break/Discussion

10:30 12:00pm  Session II: Process Induced Variations

Paul Newman (Intel): Topology Matters: When a Sensitive Circuit Meets Transistor Variation

Puneet Gupta (UCLA): Revisiting Variation Models and Their Reliability

Victor Moroz (Synopsys): Modeling Layout-Induced Proximity Effects

12:00 1:30pm    Lunch

1:30 3:00pm      Session III: Emerging Parametric Variations and Extraction

Tanya Nigam (Global Foundries): Challenges of Predicting Product Level Degradation from Simple Device Level Models

Abe Elfadel (IBM): Efficient Techniques for Variation-Aware Electrical Modeling adn Verficication of VLSI Interconnect

Xin Li (CMU): Virtual Probe: Minimum-Cost Silicon Characterization of Nanoscale Integrated Circuits

3:00 3:30pm      Afternoon Break/Discussion

3:30 5:00pm      Session IV: Characterization of Device and Circuit Variability

Vikas Chandra (ARM): Challenges of Designing Robust Physical IP in Nanoscale CMOS Technologies

Lawrence Clark (ASU): In-Situ Characterization of SRAM Variability

Chris Kim (Univ. of Minnesota): On-Chip Reliability Monitors: Circuit Ideas, Measurements and Limitations

5:00 5:10pm      Closing Remarks


Workshop Organizers

Technical Advisor: Sani Nassif, IBM Austin Research Lab, nassif AT us DOT ibm DOT com

Frank Liu, IBM Austin Research Lab, frankliu AT us DOT ibm DOT com

Yu (Kevin) Cao, Arizona State University, ycao AT asu DOT edu

Hidetoshi Onodera, Kyoto University, onodera AT vlsi DOT kuee DOT kyoto-u DOT ac DOT jp





Last updated on November 21, 2009. Contents subject to change. All rights reserved.